High dose low temperature Ti and Al implantation in metals

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 1260-1263

  Safonov, V I ^a   Marchenko, I G ^a   Kartmazov, G N ^b   Neklyudov, I M ^b   Dikiy, N I ^b  

^a Scientific Center of Physical Technologies Kharkiv   (Ukraine)

^b KHARKOV INSTITUTE OF PHYSICS AND TECHNOLOGY   (Ukraine)

Author keywords

Aluminium; Computer simulation; Copper; Ion implantation

Indexed keywords

ALUMINUM; CONCENTRATION (PROCESS); CORROSION RESISTANCE; ION IMPLANTATION; PROTECTIVE COATINGS; TITANIUM;

IRRADIATION ENERGY;

COATING TECHNIQUES;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 18144445218     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00684-4     Document Type: Article

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