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Volumn 174-175, Issue , 2003, Pages 708-712

Alloyed and hydrogenated diamond-like carbon thin films deposited by a new high performance microwave low pressure plasma source

(6) Niederberger, L a Holleck, H a Leiste, H a Stuber M a Ulrich, S a Baumann, H b

a KARLSRUHE INSTITUTE OF TECHNOLOGY (Germany)

b GOETHE UNIVERSITY (Germany)

Author keywords

CVD PVD hybrid; DLC

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; COMPOSITION; ELASTIC MODULI; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARDNESS; HYDROGENATION; MAGNETRON SPUTTERING; MICROWAVES; PHYSICAL VAPOR DEPOSITION; PLASMA SOURCES; STRESS ANALYSIS; THIN FILMS;

MICROWAVE PLASMAS;

DIAMOND LIKE CARBON FILMS;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 18144439530 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(03)00612-1 Document Type: Article

Times cited : (13)

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