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Volumn 377-379, Issue , 1997, Pages 220-224

Metallization onset in K/Si(100)-(2 × 1)

Author keywords

Alkali metals; Angle resolved photoemission; Interface states; Metal semiconductor interfaces; Photoelectron emission; Schottky barrier; Semiconducting surfaces; Silicon; Single crystal epitaxy; Vicinal single crystal surfaces

Indexed keywords

BAND STRUCTURE; BINDING ENERGY; EPITAXIAL GROWTH; INTERFACES (MATERIALS); METALLIZING; PHASE TRANSITIONS; PHOTOEMISSION; POTASSIUM; SCHOTTKY BARRIER DIODES; SEMICONDUCTING SILICON; SINGLE CRYSTALS;

EID: 18144433427     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(96)01359-3     Document Type: Article
Times cited : (4)

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    • note
    • On the basis of our data alone, an absolute coverage calibration is difficult. Probably due to inaccuracies in the actual surface temperature during evaporation [13], saturation values between 0.6 and 0.7 [4] and 0.98±0.05 ML [32] have been found. Minute amounts of contaminants could also significantly increase the saturation coverage [10].
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