Advanced MEMS fabrication using CMP

Semiconductor International

Volumn 27, Issue 9, 2004, Pages 54-56

  Von Trotha, Lebrecht ^a   Mörsch, Georg ^a   Zwicker, Gerfried ^b  

^a Peter Walters Surf Technol GmbH   (Germany)

^b FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CENTRIFUGATION; CMOS INTEGRATED CIRCUITS; CRYSTALLINE MATERIALS; MARKETING; MICROELECTRONICS; MICROMACHINING; OPTICAL DEVICES; OPTIMIZATION; POLISHING MACHINES; SEMICONDUCTING SILICON; SLURRIES; SURFACE ROUGHNESS;

DIGITAL MICROMIRROR ARRAYS (DMA); MEMS FABRICATION; PRESTON LAW; WAFER BONDING;

MICROELECTROMECHANICAL DEVICES;

EID: 18144423835     PISSN: 01633767     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Review

References (0)