Status and critical challenges for 157-nm lithography

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 5-10

  Ronse, K ^a   De Bisschop, P ^a   Goethals, A M ^a   Hermans, J ^a   Jonckheere, R ^a   Light, S ^a,b   Okoroanyanwu, U ^a,c   Watso, R ^a,d   McAfferty, D ^a,d   Ivaldi, J ^a,d   Oneil, T ^a,d   Sewell, H ^a,d  

^a IMEC   (Belgium)

^b MICRON TECHNOLOGY INC   (United States)

^c ADVANCED MICRO DEVICES   (United States)

^d ASML US Inc   (United States)

Author keywords

157 nm lithography; F2; Full field scanner; Hard pellicle; VUV cleaning

Indexed keywords

BIREFRINGENCE; COMPUTATIONAL METHODS; CRYSTAL ORIENTATION; IMAGING TECHNIQUES; MICROELECTRONICS; OPTIMIZATION; STRESS ANALYSIS;

157-NM LITHOGRAPHY; F2; FULL-FIELD SCANNER; HARD PELLICLE; VUV CLEANING;

LITHOGRAPHY;

EID: 18044379837     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00064-4     Document Type: Conference Paper

References (13)

1. International Technology Roadmap for Semiconductors. http://public.itrs. net.
2. Third International Symposium on 157 nm lithography, Antwerp, September, 2002.
3. Fourth International Symposium on 157 nm lithography, Yokohama, August, 2003.
4. F. Houlihan, A. Romano, D. Rentkiewicz, R. Sakamuri, R.R. Dammel, W. Conley, G. Rich, D. Miller, L. Rhodes, J. McDaniels, C. Chang, New Fluorinated Resists for Application in 157 nm Lithography Promerus, in: Fourth International Symposium on 157 nm lithography, Yokohama, August, 2003.
5. T. Moriya, M. Koh, T. Ishikawa, T. Kodani, T. Araki, M. Toriumi, H. Aoyama, T. Yamashita, T. Hagiwara, T. Furukawa, T. Itani, Novel Main-chain-Fluorinated Polymers for 157-nm Photoresists, in: Fourth International Symposium on 157 nm lithography, Yokohama, August, 2003.
6. K. Turnquest, K. Dean, V. Graffenberg, S. Patel, D. Miller, G. Rich, Advancements in 157 nm Resist Performance, in: Fourth International Symposium on 157 nm lithography, Yokohama, August, 2003.
7. T. Modderman, T. O'Neill, H. Jasper, H. Sewell, B. Tirri, H. Boom, T. Uiterdijk, S. Dana, M. Brunotte, B. Mecking, W. Kaiser, From Development to Production 157 nm Lithography Exposure Tools in: Fourth International Symposium on 157 nm lithography, Yokohama, August, 2003.
8. A. Tregub, F. Eschbach, J. Powers, F.C. Lo, Development of Fluoropolymer Membranes Transparent and Resistant to 157 nm Exposure, in: Fourth International Symposium on 157 nm lithography, Yokohama, August, 2003.
9. V. Liberman, J.H.C. Sedlacek, T.H. Fedynyshyn, R.B. Goodman, R. Sinta, Improved Pellicles for 157 nm-Lithography - A Nanocomposite Approach, in: Fourth International Symposium on 157 nm lithography, Yokohama, August, 2003.
10. Jan Hermans, F. Van Roey, D. Van den Heuvel, R. Gronheid, A.M. Goethals, K. Ronse, S. Light, R. Watso, D. McCafferty, T. O'Neil, H. Sewell, 157 nm Full Field Imaging, in: Fourth International Symposium on 157 nm lithography, Yokohama, August, 2003.
11. P. De Bisschop, R. Bruls, O. Cicilia, T. Uitterdijk, A. Grenville, M. Kocsis, C. Van Peski, Initial Assessment of the Impact of the Use of a Hard Pellicle on Imaging, in: Fourth International Symposium on 157 nm lithography, Yokohama, August, 2003.
12. T. Bloomstein, ISMT 157 nm reticle handling meeting, San Diego, 2000.
13. A. Duisterwinkel, W. van Schaik, Molecular Contamination in 157 nm Lithography: Feasibility of Reticle Cleaning, in: Third International Symposium on 157 nm lithography, Antwerp, September 2002.