Behaviour of Si and Ti doped carbon composites under exposure to the deuterium plasma

Journal of Nuclear Materials

Volumn 258-263, Issue PART 1 A, 1998, Pages 787-792

  Rubel, M ^a   Almqvist, N ^b   Wienhold, P ^c   Wu, C H ^d  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b LULEÅ UNIVERSITY OF TECHNOLOGY   (Sweden)

^c FORSCHUNGSZENTRUM JÜLICH   (Germany)

^d MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHLOROFLUOROCARBONS; DOPING (ADDITIVES); ENERGY DISPERSIVE SPECTROSCOPY; FIBER REINFORCED MATERIALS; GRAPHITE; PLASMA INTERACTIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON CARBIDE; TITANIUM CARBIDE;

LASER PROFILOMETRY; ULTRAHIGH RESOLUTION MICROSCOPY;

DEUTERIUM;

EID: 17944403876     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3115(98)00257-8     Document Type: Article

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