Cost-effective cleaning for advanced Si-processing

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1998, Pages 325-328

  Heyns, M M ^a   Bearda, T ^a   Cornelissen, I ^a   De Gendt, S ^a   Knotter, D M ^a   Loewenstein, L M ^a   Lux, M ^a   Mertens, P W ^a   Mertens, S ^a   Meuris, M ^a   Schaekers, M ^a   Snee, P ^a   Teerlinck, I ^a   Vos, R ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

COST EFFECTIVENESS; ENVIRONMENTAL IMPACT; ETCHING; GATES (TRANSISTOR); IMPURITIES; OXIDES; OZONE; SEMICONDUCTING SILICON;

GATE OXIDES;

SURFACE CLEANING;

EID: 17944393528     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)