CaCu3Ti4O12 films prepared by magnetron sputtering

Wuli Xuebao/Acta Physica Sinica

Volumn 54, Issue 4, 2005, Pages 1809-1813

  Zhou, Xiao Li ^a,b   Du, Pi Yi ^b  

^a TAIZHOU UNIVERSITY   (China)

^b ZHEJIANG UNIVERSITY   (China)

Author keywords

Activation energy; CaCu3Ti4O12; Dielectric constant; Magnetron sputtering

Indexed keywords

EID: 17944368366     PISSN: 10003290     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (13)