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Volumn 113, Issue 1, 2005, Pages 70-74

Radon monitor calibration using NIST radon emanation standards: Steady flow method

Author keywords

[No Author keywords available]

Indexed keywords

POLYETHYLENE; RADON; RADON 222;

EID: 17844379777     PISSN: 01448420     EISSN: None     Source Type: Journal    
DOI: 10.1093/rpd/nch421     Document Type: Article
Times cited : (16)

References (6)
  • 3
    • 17844372175 scopus 로고    scopus 로고
    • Bios International Corporation, 10 Park Place, NJ 07405, USA
    • Bios International Corporation, 10 Park Place, NJ 07405, USA.
  • 4
    • 17844406591 scopus 로고    scopus 로고
    • Genitron Instruments GmbH, D-60488, Heerstrausse 149, Frankfurt, Main/Germany
    • Genitron Instruments GmbH, D-60488, Heerstrausse 149, Frankfurt, Main/Germany.
  • 5
    • 17844361881 scopus 로고    scopus 로고
    • Femto Tech Inc. 325, Industry Drive, Carlisle, OH 45005, USA
    • Femto Tech Inc. 325, Industry Drive, Carlisle, OH 45005, USA.
  • 6
    • 17844410612 scopus 로고    scopus 로고
    • Rad Elec Inc. 5714-C, Industry lane, Frederick, MD 21704, USA
    • Rad Elec Inc. 5714-C, Industry lane, Frederick, MD 21704, USA.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.