Preparation of silicates using HSi(OC2H5)3 and their NO x -adsorption behavior

Journal of Sol-Gel Science and Technology

Volumn 32, Issue 1-3, 2004, Pages 311-316

  Katayama, Shingo ^a   Yamada, Noriko ^b   Awano, Masanobu ^c  

^a FCRA   (Japan)

^b NIPPON STEEL CORPORATION   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Hydrido triethoxysilane; NO x sorbent; Silicates; Solid acid base properties

Indexed keywords

ADSORPTION; DESORPTION; ELECTRIC REACTORS; GELS; ORGANIC COMPOUNDS; OXIDES; SORPTION;

HYDRIDO-TRIETHOXYSILANE; NOX SORBENTS; SILOXANE STRUCTURE; SOLID ACID-BASE PROPERTIES;

SILICATES;

EID: 17744399734     PISSN: 09280707     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10971-004-5808-2     Document Type: Conference Paper

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