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Volumn 26, Issue 4, 2005, Pages 255-257

On-state characteristics of SiC power UMOSFETs on 115-μm drift layers

Author keywords

High voltage; Power transistors; Silicon carbide; Wide bandgap

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; ELECTRIC POTENTIAL; ELECTRIC RESISTANCE; REACTIVE ION ETCHING; SEMICONDUCTING SILICON COMPOUNDS; SILICON CARBIDE;

EID: 17744382842     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2005.845495     Document Type: Article
Times cited : (74)

References (11)
  • 3
    • 0032302935 scopus 로고    scopus 로고
    • "High-voltage accumulation-layer UMOSFETs in 4H-SiC"
    • May
    • J. Tan, J. A. Cooper, Jr., and M. R. Melloch, "High-voltage accumulation-layer UMOSFETs in 4H-SiC," IEEE Electron Device Lett. vol. 19, no. 5, pp. 487-489, May 1998.
    • (1998) IEEE Electron Device Lett. , vol.19 , Issue.5 , pp. 487-489
    • Tan, J.1    Cooper Jr., J.A.2    Melloch, M.R.3
  • 4
    • 0020795783 scopus 로고
    • "Increased available breakdown voltage and controlled surface electric fields using a junction termination extension (JTE) technique"
    • V.A.K. Temple, "Increased available breakdown voltage and controlled surface electric fields using a junction termination extension (JTE) technique," IEEE Trans. Electron Devices, vol. ED-30, pp. 954-957, 1983.
    • (1983) IEEE Trans. Electron Devices , vol.ED-30 , pp. 954-957
    • Temple, V.A.K.1
  • 5
    • 17744392044 scopus 로고    scopus 로고
    • "Structure for Increasing the Maximum Voltage of Silicon Carbide UMOS Power Transistors"
    • Jan. 30
    • J.A. Cooper, Jr., "Structure for Increasing the Maximum Voltage of Silicon Carbide UMOS Power Transistors," U.S. Patent 6 180 958, Jan. 30, 2001.
    • (2001) U.S. Patent 6 180 958
    • Cooper Jr., J.A.1
  • 7
    • 17744399369 scopus 로고    scopus 로고
    • "The effect of crystal orientation and post-oxidation NO anneal on inversion layer electron mobility in 4H-SiC UMOSFETs"
    • presented at the Electronic Materials Conf., Santa Barbara, CA, Jun. 26-28
    • I. Khan, J. A. Cooper Jr., T. Isaacs-Smith, J. R. Williams, and L. C. Feldman, "The effect of crystal orientation and post-oxidation NO anneal on inversion layer electron mobility in 4H-SiC UMOSFETs," presented at the Electronic Materials Conf., Santa Barbara, CA, Jun. 26-28, 2002.
    • (2002)
    • Khan, I.1    Cooper Jr., J.A.2    Isaacs-Smith, T.3    Williams, J.R.4    Feldman, L.C.5
  • 8
    • 17744375222 scopus 로고    scopus 로고
    • "Recent progress in the development of SiC power switches"
    • presented at the Int. Conf. Silicon Carbide and Related Materials, Lyon, France, Oct. 5-10
    • D. Stephani, "Recent progress in the development of SiC power switches," presented at the Int. Conf. Silicon Carbide and Related Materials, Lyon, France, Oct. 5-10, 2003.
    • (2003)
    • Stephani, D.1
  • 9
    • 0035395786 scopus 로고    scopus 로고
    • "Electron mobility models for 4H, 6H, and 3C SiC"
    • Dec
    • M. Roschke and F. Schwierz, "Electron mobility models for 4H, 6H, and 3C SiC." IEEE Trans. Electron Devices, vol. 48, no. 12, pp. 1442-1447, Dec. 2001.
    • (2001) IEEE Trans. Electron Devices , vol.48 , Issue.12 , pp. 1442-1447
    • Roschke, M.1    Schwierz, F.2
  • 10
    • 17744374337 scopus 로고    scopus 로고
    • "High voltage SiC UMOSFETs"
    • Ph.D. dissertation, Purdue Univ., West Lafayette, IN, Aug
    • I. Khan, "High voltage SiC UMOSFETs," Ph.D. dissertation, Purdue Univ., West Lafayette, IN, Aug. 2002.
    • (2002)
    • Khan, I.1
  • 11
    • 0036045971 scopus 로고    scopus 로고
    • "High voltage UMOSFETs in 4H SiC"
    • presented at the Int. Symp. Power Semiconductor Devices and ICs, Santa Fe. NM. Jun. 4-7
    • I. Khan, J. A. Cooper, Jr., M. A. Capano, T. Isaacs-Smith, and J. R. Williams, "High voltage UMOSFETs in 4H SiC," presented at the Int. Symp. Power Semiconductor Devices and ICs, Santa Fe. NM. Jun. 4-7, 2002.
    • (2002)
    • Khan, I.1    Cooper Jr., J.A.2    Capano, M.A.3    Isaacs-Smith, T.4    Williams, J.R.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.