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Silicon Carbide, Recent Major Advances
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Agarwal, A.1
Ryu, S.H.2
Palmour, J.3
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2
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8744258901
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"Development of 10 kV 4H-SiC power DMOSFETs"
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S.H. Ryu, S. Krishnaswami, A. Agarwal, J. Richmond, and J. Palmour, "Development of 10 kV 4H-SiC power DMOSFETs," in Mater. Sci. For. vol. 457-460, 2004, pp. 1385-1388.
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Mater. Sci. For.
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Ryu, S.H.1
Krishnaswami, S.2
Agarwal, A.3
Richmond, J.4
Palmour, J.5
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3
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0032302935
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"High-voltage accumulation-layer UMOSFETs in 4H-SiC"
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May
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J. Tan, J. A. Cooper, Jr., and M. R. Melloch, "High-voltage accumulation-layer UMOSFETs in 4H-SiC," IEEE Electron Device Lett. vol. 19, no. 5, pp. 487-489, May 1998.
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IEEE Electron Device Lett.
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Tan, J.1
Cooper Jr., J.A.2
Melloch, M.R.3
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4
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0020795783
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"Increased available breakdown voltage and controlled surface electric fields using a junction termination extension (JTE) technique"
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V.A.K. Temple, "Increased available breakdown voltage and controlled surface electric fields using a junction termination extension (JTE) technique," IEEE Trans. Electron Devices, vol. ED-30, pp. 954-957, 1983.
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IEEE Trans. Electron Devices
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Temple, V.A.K.1
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5
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17744392044
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"Structure for Increasing the Maximum Voltage of Silicon Carbide UMOS Power Transistors"
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Jan. 30
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J.A. Cooper, Jr., "Structure for Increasing the Maximum Voltage of Silicon Carbide UMOS Power Transistors," U.S. Patent 6 180 958, Jan. 30, 2001.
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(2001)
U.S. Patent 6 180 958
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Cooper Jr., J.A.1
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6
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0034869615
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"Nitrogen passivation of the interface states near the conduction band edge in 4H-silicon carbide"
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J.R. Williams, G. Y. Chung, C. C. Tin, K. McDonald, D. Farmer, R. K. Chanana, R. A. Weller, S. T. Pantelides, O. W. Holland, M. K. Das, L. A. Lipkin, and L. C. Feldman, "Nitrogen passivation of the interface states near the conduction band edge in 4H-silicon carbide," in Proc. Materials Research Society Symp., vol. 640, 2001, pp. H.3.5.1-H.3.5.12.
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Proc. Materials Research Society Symp.
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Williams, J.R.1
Chung, G.Y.2
Tin, C.C.3
McDonald, K.4
Farmer, D.5
Chanana, R.K.6
Weller, R.A.7
Pantelides, S.T.8
Holland, O.W.9
Das, M.K.10
Lipkin, L.A.11
Feldman, L.C.12
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7
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17744399369
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"The effect of crystal orientation and post-oxidation NO anneal on inversion layer electron mobility in 4H-SiC UMOSFETs"
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presented at the Electronic Materials Conf., Santa Barbara, CA, Jun. 26-28
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I. Khan, J. A. Cooper Jr., T. Isaacs-Smith, J. R. Williams, and L. C. Feldman, "The effect of crystal orientation and post-oxidation NO anneal on inversion layer electron mobility in 4H-SiC UMOSFETs," presented at the Electronic Materials Conf., Santa Barbara, CA, Jun. 26-28, 2002.
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(2002)
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Khan, I.1
Cooper Jr., J.A.2
Isaacs-Smith, T.3
Williams, J.R.4
Feldman, L.C.5
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8
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17744375222
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"Recent progress in the development of SiC power switches"
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presented at the Int. Conf. Silicon Carbide and Related Materials, Lyon, France, Oct. 5-10
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D. Stephani, "Recent progress in the development of SiC power switches," presented at the Int. Conf. Silicon Carbide and Related Materials, Lyon, France, Oct. 5-10, 2003.
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(2003)
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Stephani, D.1
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9
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0035395786
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"Electron mobility models for 4H, 6H, and 3C SiC"
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Dec
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M. Roschke and F. Schwierz, "Electron mobility models for 4H, 6H, and 3C SiC." IEEE Trans. Electron Devices, vol. 48, no. 12, pp. 1442-1447, Dec. 2001.
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(2001)
IEEE Trans. Electron Devices
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, Issue.12
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Roschke, M.1
Schwierz, F.2
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10
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17744374337
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"High voltage SiC UMOSFETs"
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Ph.D. dissertation, Purdue Univ., West Lafayette, IN, Aug
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I. Khan, "High voltage SiC UMOSFETs," Ph.D. dissertation, Purdue Univ., West Lafayette, IN, Aug. 2002.
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(2002)
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Khan, I.1
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11
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0036045971
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"High voltage UMOSFETs in 4H SiC"
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presented at the Int. Symp. Power Semiconductor Devices and ICs, Santa Fe. NM. Jun. 4-7
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I. Khan, J. A. Cooper, Jr., M. A. Capano, T. Isaacs-Smith, and J. R. Williams, "High voltage UMOSFETs in 4H SiC," presented at the Int. Symp. Power Semiconductor Devices and ICs, Santa Fe. NM. Jun. 4-7, 2002.
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(2002)
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Khan, I.1
Cooper Jr., J.A.2
Capano, M.A.3
Isaacs-Smith, T.4
Williams, J.R.5
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