Structural and electrical properties of antimony trisulftde thin films

Journal of Optoelectronics and Advanced Materials

Volumn 7, Issue 2, 2005, Pages 727-732

  Tigau, N ^a   Rusu, G I ^b   Ciupina, V ^c   Prodan, G ^c   Vasile, E ^d  

^a DUNAREA DE JOS UNIVERSITY OF GALATI   (Romania)

^b ALEXANDRU IOAN CUZA UNIVERSITY OF IASI   (Romania)

^c OVIDIUS UNIVERSITY   (Romania)

^d Metav SA Bucuresti   (Romania)

Author keywords

Antimony trisulfide; Electrical conductivity; Structural properties

Indexed keywords

ACTIVATION ENERGY; ELECTRIC CONDUCTIVITY; FERMI LEVEL; GLASS; GRAIN SIZE AND SHAPE; PERMITTIVITY; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

ANTIMONY TRISULFIDE; ELECTRICAL CONDUCTIVITY; STRUCTURAL PROPERTIES; THERMAL VACUUM EVAPORATION;

ANTIMONY COMPOUNDS;

EID: 17744378755     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (37)

1. J. Grigas, J. Meshkanskas, J. Orlimans, Physica Status Solidi (A)37, 10 (1976).
2. M. S. Ablova, A. A. Andreev, T. T. Degegkaev, B. T. Melekh, A. B. Pevtsov, N. S. Shendel, L. N. Shurnilova, Sov. Phys. Semicond. 10, 6 (1976).
3. M. J. Chokalingam, K. Nagaraja Rao, R. Rangarajan and C. V. Suryanarayana, J. Phys. D.: Appl. Phys. 3, 1641 (1970).
4. G. Ghosh, B. P. Varma, Thin Solid Films 69, 61 (1979).
5. E. Montrimass, A. Pazera, Thin Solid Films 34, 65 (1976).
6. J. George and M. K. Radhakrishan, Solid State Commun. 33, 987 (1980).
7. M. T. S.Nair, Y. Pena, J. Campos, V. M. Garcia, P. K. Nair, J. Electrochem. Soc. 145, 2113 (1998).
8. S. M. Sze, Physics of Semiconductor Devices, Wiley, New York (1981).
9. R. S. Mane, B. R. Sankapal, C. D. Lokhande, Thin Solid Films 353, 29 (1999).
10. J. D. Desai, D. D. Lokhande, Thin solid Films 237, 29 (1994).
11. O. Savadogo, K. C. Manda, Solar Energy Mater. Solar Cell 26, 117 (1992).
12. C. H. Bhosale, M. D. Uplane, P. S. Patil, C. D. Lokhande, Thin Solid Films 248, 137 (1994).
13. V. V. Killedar, C. D. Lokhande, C. H. Bhosale, Mater. Chem. Phys. 47, 104 (1997).
14. S. Mahanty, J. M. Merino, M. Leon, J. Vac. Sci. Technol. A15, 3060 (1997).
15. P. Arun, A. G. Vedeshwar, J. Non-Cryst. Solids 220, 63 (1997).
16. I. K. El Zawawi, A. Abdel-Moez, F. S. Terra, M. Mounir, Thin Solid Films 324, 300 (1998).
17. I. K. El Zawawi, A. Abdel-Moez, F. S. Terra, M. Mounir, Fizika A7(3), 97 (1998).
18. A. G. Vedeshwar, J. Phys. III France 5, 1161 (1995).
19. A. M. Salem, M. Soliman Selim, J. Phys.D: Appl. Phys. 34, 12 (2001).
20. V. D. Das, L. Damodure, J. Appl. Phy. 81, 1522 (1997).
21. N. Tigau, G. I. Rusu, C. Gheorghies, J. Optoelectron. Adv. Mater. 4, 943 (2002)
22. N. Tigau, V. Ciupina, G. Prodan, G. I. Rusu, C. Gheorghies, E. Vasile, J. Optoelectron. Adv. Mater. 1, 211 (2004).
23. J. Y. W. Seto, J. Electrochem. Soc. 122, 701 (1975).
24. J. Y. W. Seto, J. Appl. Phys. 465, 247 (1975).
25. G. Baccarani, B. Rico, G. Spandini, J. Appl. Phys. 49, 5565 (1978).
26. C. H. Seager, T. G. Gastner, J. Appl. Phys. 49, 3879 (1978).
27. K. L. Chopra, Thin Film Phenomena, McGraw-Hill, New York, (1969).
28. G. I. Rusu, I. Caplanus, L. Leontie, A. Airinei, D. Mardare, I.I. Rusu, Acta Mater. 49, 553 (2001).
29. M. S. Droichi, F. Vaillant, E. Bustarret, D. Jousse, J. Non-Cryst. Solids 101, 151 (1997).
30. K. Y. Rajpure, A. L. Dhebe, C. D. Lokhande, C. H. Bhosale, Mater. Chem. Phys. 56 177 (1998).
31. Y. Wada, S. Nishimatsu, J. Electrochem. Soc. 125, 1499 (1978).
32. J. E. Palmer, C. V. Thompson, H. I. Smith, J. Appl. Phys. 62, 2492 (1987).
33. R. A. Ristau, K. Barmak, K. R. Coffey, J. K. Howard, J. Mater. Res. 14, 3263 (1999).
34. H. F. Wolf, Semiconductors, Wiley, New York, 1971.
35. K. Seeger, Semiconductors Physics, Springer, Berlin, 1999.
36. L. L. Kazmerski (ed.), Polycrystalline and Amorphous Thin Films and Devices, Academic Press, New York, 1980.
37. B. H. Juarez, S. Rubio, J. Sanchez-Dehesa, C. Lopez, Adv. Mater. 20, 1486 (2002).