Optical and surface properties TiO2 thin films deposited by DC magnetron sputtering method

Journal of Optoelectronics and Advanced Materials

Volumn 7, Issue 2, 2005, Pages 771-774

  Stamate, M ^a   Vascan, I ^a   Lazar, I ^a   Lazar, G ^a   Caraman, I ^a   Caraman, M ^a  

^a VASILE ALECSANDRI UNIVERSITY OF BACAU   (Romania)

Author keywords

DC magnetron sputtering method; Optical gap; TiO2

Indexed keywords

ANNEALING; ANODIC OXIDATION; FILM GROWTH; GLASS; INTERFEROMETRY; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; OXYGEN; REFRACTIVE INDEX; STOICHIOMETRY; SURFACE PROPERTIES; THIN FILMS;

DC MAGNETRON SPUTTERING METHOD; OPTICAL GAPS; REACTIVE SPUTTERING; TIO2;

TITANIUM DIOXIDE;

EID: 17744371134     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (9)

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