Zero-potential condition in thermally poled silica samples: Evidence of a negative electric field outside the depletion layer

Journal of the Optical Society of America B: Optical Physics

Volumn 22, Issue 3, 2005, Pages 598-604

  Quiquempois, Yves ^a   Kudlinski, Alexandre ^a   Martinelli, Gilbert ^a  

^a USTL Bât C5   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELDS; ETCHING; HYDROFLUORIC ACID; MATHEMATICAL MODELS; NEODYMIUM LASERS; OPTICAL FIBERS; OPTICAL WAVEGUIDES; PUMPING (LASER); Q SWITCHED LASERS; SILICA;

ELECTRIC FIELD DISTRIBUTION; POLED SILICA; ZERO POTENTIAL CONDITION;

OPTICAL GLASS;

EID: 17744362716     PISSN: 07403224     EISSN: None     Source Type: Journal    
DOI: 10.1364/JOSAB.22.000598     Document Type: Article

References (11)

1. R. A. Myers, N. Mukherjee, and S. R. J. Brueck, "Large second-order nonlinearity in poled fused silica," Opt. Lett. 16, 1732-1734 (1991).
2. P. G. Kazansky, A. R. Smith, P. St. Russel, G. M. Yang, and G. M. Sessler, "Thermally poled silica glass: laser induced pressure pulse probe of charge distribution," Appl. Phys. Lett. 68, 269-271 (1996).
3. T.G. Alley, S. R. J. Brueck, and M. Wiedenbeck, "Secondary ion mass spectroscopy study of space-charge formation in thermally poled fused silica," J. Appl. Phys. 86, 6634-6640 (1999).
4. Y. Quiquempois, N. Godbout, and S. Lacroix, "Model of charge migration during poling in silica glasses: evidence of a voltage threshold for the onset of a second-order nonlinearity," Phys. Rev. A 65, 043816 (2002).
5. A. Kudlinski, G. Martinelli, Y. Quiquempois, and H. Zeghlache, "Microscopic model for the second-order nonlinearity creation in thermally poled bulk silica glasses," in Proceedings of Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides: Applications and Fundamentals, Vol. 93 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2003), pp. 213-215.
6. D. Faccio, V. Pruneri, and P. G. Kazansky, "Dynamics of the second order nonlinearity in thermally poled silica glass," Appl. Phys. Lett. 79, 2687-2689 (2001).
7. A. Kudlinski, Y. Quiquempois, M. Lelek, H. Zeghlache, and G. Martinelli, "Complete characterization of the nonliear spatial distribution induced in poled silica glass with a submicron resolution," Appl. Phys. Lett. 83, 3623-3625 (2003).
8. W. Margulis and F. Laurell, "Interferometric study of poled glass under etching," Opt. Lett. 21, 1786-1788 (1996).
9. A. L. C. Triques, C. M. B. Cordeiro, V. Balestrieri, B. Lesche, W. Margulis, and I. C. S. Carvalho, "Depletion region in thermally poled fused silica," Appl. Phys. Lett. 76, 2496-2498 (2000).
10. B. Lesche, F. C. Garcia, E. N. Hering, W. Margulis, I. C. S. Carvahlo, and F. Laurell, "Etching of silica glass under electric fields," Phys. Rev. Lett. 78, 2172-2175 (1997).
11. Y. Quiquempois, A. Kudlinski, G. Martinelli, W. Margulis, and I. C. S. Carvalho, "Near surface modification of the third order nonlinear susceptibility in thermally poled silica glasses," Appl. Phys. Lett., submitted for publication.