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Thin Solid Films

Volumn 451-452, Issue , 2004, Pages 320-323

Electric-field effect on metal induced crystallization of amorphous silicon

(5) Kim, Kyung Ho a Kim, Ah Young a Park, Seong Jin a Park, Kyu Chang a Jang, Jin a

a Kyung Hee University (South Korea)

Author keywords

Electric field strength; MIC; Ni diffusion

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; DIFFUSION; ELECTRIC FIELD EFFECTS; MASKS; NICKEL; NUCLEATION; POLYCRYSTALLINE MATERIALS; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRIC FIELD STRENGTH; METAL INDUCED CRYSTALLIZATION (MIC);

AMORPHOUS SILICON;

EID: 17644444306 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2003.11.057 Document Type: Conference Paper

Times cited : (11)

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