Post-CMP cleaning for oxide and tungsten applications

Semiconductor International

Volumn 19, Issue 5, 1996, Pages

  De Larios, John M ^a   Ravkin, Mike ^a   Hetherington, Dale L ^a   Doyle, John J ^a  

^a OnTrak Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDS; AMMONIUM COMPOUNDS; CHEMICAL CLEANING; CHEMICALS; DIELECTRIC MATERIALS; OXIDES; SLURRIES; SOLUTIONS; TUNGSTEN;

ACID PROCESSORS; CHEMICAL MECHANICAL PLANARIZATION; CLEANING EQUIPMENT; INTERLEVEL DIELECTRIC PLANARIZATION; WATER BRUSH SCRUBBING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 17644435619     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (14)