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Volumn 19, Issue 5, 1996, Pages
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Low k dielectrics: the search continues
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NONE
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Author keywords
[No Author keywords available]
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Indexed keywords
CAPACITANCE;
CHEMICAL VAPOR DEPOSITION;
DIELECTRIC PROPERTIES;
ELECTRIC INSULATING MATERIALS;
FLUORINE COMPOUNDS;
INORGANIC COMPOUNDS;
ORGANIC COMPOUNDS;
OXIDES;
PERMITTIVITY;
PLASMA APPLICATIONS;
SEMICONDUCTOR DEVICE MANUFACTURE;
FLUORINATED OXIDES;
INTERMETAL DIELECTRICS;
LOW PERMITTIVITY DIELECTRICS;
NOVELLUS SPEED SYSTEM;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
DIELECTRIC MATERIALS;
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EID: 17644429195
PISSN: 01633767
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
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Times cited : (9)
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References (4)
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