High performance n-type organic field-effect transistors based on π-electronic systems with trifluoromethylphenyl groups

Journal of the American Chemical Society

Volumn 127, Issue 15, 2005, Pages 5336-5337

  Ando, Shinji ^a   Nishida, Jun Ichi ^a   Tada, Hirokazu ^b   Inoue, Youji ^c   Tokito, Shizuo ^c   Yamashita, Yoshiro ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b INSTITUTE FOR MOLECULAR SCIENCE   (Japan)

^c NHK SCIENCE AND TECHNICAL RESEARCH LABORATORIES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARTICLE; CHEMICAL INTERACTION; CHEMICAL REACTION; CRYSTAL; DIFFERENTIAL SCANNING CALORIMETRY; ELECTROCHEMISTRY; ELECTRON; ELECTRONICS; ENERGY; GEOMETRY; OXIDATION REDUCTION REACTION; SEMICONDUCTOR; SPECTRAL SENSITIVITY; STRUCTURE ANALYSIS; X RAY CRYSTALLOGRAPHY;

EID: 17644413162     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja042219+     Document Type: Article

References (18)

1. (a) Dimitrakopoulos, C. D.; Malenfant, P. R. L. Adv. Mater. 2002, 14, 99.
2. (b) Newman, C. R.; Frisbie, C. D.; Demetrio, A.; da Silva Filho, D. A.; Bredas, J.-L.; Ewbank, P. C.; Mann, K. R. Chem. Mater. 2004, 16, 4436.
3. (a) Gundlach, D. J.; Lin, Y. Y.; Jackson, T. N.; Nelson, S. F. Appl. Phys. Lett. 2002, 80, 2925.
4. (b) Meng, H.; Bendikov, M.; Mitchell, G.; Helgeson, R.; Wudl, F.; Bao, Z.; Siegrist, T.; Kloc, C.; Chen, C. H. Adv. Mater. 2003, 15, 1090.
5. Halik, M.; Klauk, H.; Zschieschang, U.; Schmid, G.; Ponomarenko, S.; Kirchmeyer, S.; Weber, W. Adv. Mater. 2003, 15, 917.
6. (a) Katz, H. E.; Johnson, J.; Andrew, J.; Li, W. J. Am. Chem. Soc. 2000, 122, 7787.
7. (b) Malenfant, P. R. L.; Dimitrakopoulos, C. D.; Gelorme, J. D.; Kosbar, L. L.; Graham, T. O. Appl. Phys. Lett. 2002, 80, 2517.
8. (c) Chesterfield, R. J.; Newman, C. R.; Pappenfls, T. M.; Ewbank, P. C.; Haukaas, M. H.; Mann, K. R.; Miller, L. L.; Frisbie, C. D. Adv. Mater. 2003, 15, 1278.
9. (a) Sakamoto, Y.; Suzuki, T.; Kobayashi, M.; Gao, Y.; Fukai, Y.; Inoue, Y.; Sato, F.; Tokito, S. J. Am. Chem. Soc. 2004, 126, 8138.
10. (b) Mushrush, M.; Facchetti, A.; Lefenfeld, M.; Katz, H. E.; Marks, T. J. J. Am. Chem. Soc. 2003, 125, 9414.
11. (c) Yoon, M.-H.; DiBenedetto, S. A.; Facchetti, A.; Marks, T. J. J. Am. Chem. Soc. 2005, 127, 1348.
12. (a) Facchetti, A.; Mushrush, M.; Katz, H. E.; Marks, T. J. Adv. Mater. 2003, 15, 33.
13. (b) Facchetti, A.; Letizia, J.; Yoon, M.-H.; Mushrush, M.; Katz, H. E.; Marks, T. J. Chem. Mater. 2004, 16, 4715.
14. Ando, S.; Nishida, J.; Fujiwara, E.; Tada, H.; Inoue, Y.; Tokito, S.; Yamashita, Y. J. Mater. Chem. 2004, 14, 1787.
15. 6 as a supporting electrolyte in dichloromethane.
16. (a) Fichou, D. J. Mater. Chem. 2000, 10, 571.
17. (b) Lovinger, A. J.; Davis, D. D.; Dodabalapur, A.; Katz, H. E. Chem. Mater. 1996, 8, 2836.
18. Moon, H.; Zeis, R.; Borkent, E. J.; Besnard, C.; Lovinger, A. J.; Siegrist, T.; Kolc, C.; Bao, Z. J. Am. Chem. Soc. 2004, 126, 15322.