Fabrication of single nickel-nitrogen defects in diamond by chemical vapor deposition

Applied Physics Letters

Volumn 86, Issue 13, 2005, Pages 1-3

  Rabeau, J R ^a   Chin, Y L ^a,c   Prawer, S ^a   Jelezko, F ^b   Gaebel, T ^b   Wrachtrup, J ^b  

^a UNIVERSITY OF MELBOURNE   (Australia)

^b UNIVERSITY OF STUTTGART   (Germany)

^c UNIVERSITY OF CANTERBURY   (New Zealand)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FUSED SILICA; INTERFEROMETERS; NICKEL; NITROGEN; PHOTODETECTORS; PHOTONS;

ANTIBUNCHING; CONFOCAL MICROSCOPE; HOLOGRAPHIC NOTCH FILTERS; OPTICALLY ACTIVE DEFECTS;

DEFECTS;

EID: 17644392811     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1896088     Document Type: Article

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