Effect of chemical treatment on TiO2 particles by IMPS

Chinese Journal of Chemistry

Volumn 20, Issue 10, 2002, Pages 978-982

  Yin, Feng ^a   Lin, Yuan ^a   Lin, Rui Feng ^a   Li, Xue Ping ^a   Xiao, Xu Rui ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

HCl treatment; IMPS; Photocatalytic activity; Photodegradation; TiO2 particulate suspension

Indexed keywords

EID: 17644386648     PISSN: 1001604X     EISSN: None     Source Type: Journal    
DOI: 10.1002/cjoc.20020201011     Document Type: Article

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