Auger electron spectroscopy determination of surface self-diffusion coefficients from growth of voids in thin deposited films

Applied Surface Science

Volumn 212-213, Issue SPEC., 2003, Pages 787-791

  Beszeda, I ^a,b   Szabo I A ^b   Gontier Moya, E G ^a  

^a AIX MARSEILLE UNIVERSITÉ   (France)

^b UNIVERSITY OF DEBRECEN   (Hungary)

Author keywords

Auger electron spectroscopy; Surface diffusion; Surface topography; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; DIFFUSION; EVAPORATION; MORPHOLOGY; SURFACE TOPOGRAPHY; THIN FILMS;

BEADING;

METALLIC FILMS;

EID: 17544385784     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00109-0     Document Type: Conference Paper

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