|
Volumn 51-52, Issue , 1996, Pages 335-340
|
Growth and electrical properties of reactively sputtered WSx thin films
a
a
EPFL
(Switzerland)
|
Author keywords
Sputtering; Sulphides; Tungsten
|
Indexed keywords
|
EID: 17544375219
PISSN: 10120394
EISSN: None
Source Type: Book Series
DOI: None Document Type: Article |
Times cited : (3)
|
References (5)
|