|
Volumn 47-48, Issue , 1996, Pages 613-618
|
An analysis of residual strain in dry etched semiconductor nanostructures
a a |
Author keywords
[No Author keywords available]
|
Indexed keywords
CADMIUM TELLURIDE;
DEFECTS;
ETCHING;
GALLIUM ARSENIDE;
II-VI SEMICONDUCTORS;
III-V SEMICONDUCTORS;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR QUANTUM WIRES;
ETCHED NANOSTRUCTURES;
ETCHING CONDITION;
NANO-METER SCALE;
PHOTOLUMINESCENCE AND RAMAN SPECTROSCOPY;
PHOTOREFLECTANCE;
SEMICONDUCTOR NANOSTRUCTURES;
STRAIN CHARACTERISTICS;
THERMAL-ANNEALING;
NANOSTRUCTURES;
|
EID: 17544375092
PISSN: 10120394
EISSN: None
Source Type: Book Series
DOI: None Document Type: Article |
Times cited : (5)
|
References (22)
|