1/f Noise transformation that accompanies the trimming of polycrystalline silicon layers

Solid State Phenomena

Volumn 51-52, Issue , 1996, Pages 391-396

  Tkachenko, N N ^a  

^a ZAPORIZHZHIA NATIONAL UNIVERSITY   (Ukraine)

Author keywords

1 f Noise; Resistance Across Grain Boundary; Thin Film Resistor

Indexed keywords

EID: 17544367407     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/ssp.51-52.391     Document Type: Article

References (4)

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2. K.Kato, T.Ono and Y.Amemiya, IEEE Trans, on Electron Dev., ED-29, 1156 (1982).
3. H.C. de Graaf, M.T.M.Huybers, J.Appl.Phys. 54, 4463 (1983).
4. N.B.Lukyanchikova, G.S.Pekar, N.N.Tkachenko, Hoang Mi Shin, and K.Sheinkman, Phys.Stat.Sol. (a) 41 229 (1977).