Carbon nanofilm with a new structure and property

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 42, Issue 9 AB, 2003, Pages

  Horiuchi, Shigeo ^a   Gotou, Takuya ^a   Fujiwara, Masahiro ^a   Sotoaka, Ryuji ^a   Hirata, Masukazu ^a   Kimoto, Koji ^b   Asaka, Toru ^b   Yokosawa, Tadahiro ^b   Matsui, Yoshio ^b   Watanabe, Kenji ^b   Sekita, Masami ^b  

^a MITSUBISHI GAS CHEMICAL COMPANY INC   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Carbon nanofilm; ED; EELS; HRTEM; O C; Semiconductor; Stacking sequence; Structure analysis; Thickness

Indexed keywords

ELECTRON DIFFRACTION; ELECTRON ENERGY LOSS SPECTROSCOPY; HEATING; NANOSTRUCTURED MATERIALS; OXIDATION; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

CARBON NANOFILM; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MOLAR RATIO; NANOMETER THICKNESS;

CARBON;

EID: 17444438527     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.l1073     Document Type: Letter

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