Fabrication and characterization of InN-based quantum well structures grown by radio-frequency plasma-assisted molecular-beam epitaxy

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 44, Issue 1-7, 2005, Pages

  Kurouchi, Masahito ^a   Naoi, Hiroyuki ^a   Araki, Tsutomu ^a   Mlyajima, Takao ^b   Nanishl, Yasushi ^a  

^a RITSUMEIKAN UNIVERSITY   (Japan)

^b SONY CORPORATION   (Japan)

Author keywords

In rich InXGa1 XN; InN; Optical property; Quantum well; RF MBE; X ray diffraction

Indexed keywords

INDIUM COMPOUNDS; MOLECULAR BEAM EPITAXY; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; PLASMA APPLICATIONS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SEMICONDUCTOR GROWTH; STRUCTURE (COMPOSITION); X RAY DIFFRACTION ANALYSIS;

IN-RICH INXGA1-XN; INN; QUANTUM SIZE EFFECT; RADIO FREQUENCY MOLECULAR BEAM EPITAXY (RF-MBE); STARK EFFECT;

SEMICONDUCTOR QUANTUM WELLS;

EID: 17444422192     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.L230     Document Type: Article

References (13)

1. V. Y. Davydov, A. A. Klochikhin, R. P. Seisyan, V. V. Emtsev, S. V. Ivanov, F. Beehstedt, J. Furthmuller, H. Harima, A. V. Mudryi, J. Aderhold, O. Semchinova and J. Graul: Phys. Status Solidi B 229 (2002) R1.
2. J. Wu, W. Walukievicz, K. M. Yu, J. W. Ager III, E. E. Haller, H. Lu, W. J. Schaff, Y. Saito and Y. Nanishi: Appl. Phys. Lett. 80 (2002) 3967.
3. T. Matsuoka, H. Okamoto, M. Nakao, H. Harima and E. Kurimoto: Appl. Phys. Lett. 81 (2002) 1246.
4. Y. Saito, H. Harima, E. Kurimoto, T. Yamaguchi, N. Teraguchi, A. Suzuki, T. Araki and Y. Nanishi: Phys. Status Solidi B 234 (2002) 796.
5. T. L. Tansley and C. P. Foley: J. Appl. Phys. 59 (1986) 3241.
6. T. Ohashi, T. Kouno, M. Kawai, A. Kikuchi and K. Kishino: Phys. Status Solidi A 201 (2004) 2850.
7. M. Kurouchi, T. Yamaguchi, H. Naoi, A. Suzuki, T. Araki and Y. Nanishi: to be published in J. Cryst. Growth.
8. J. W. Matthews and A. E. Blakeslee: J. Cryst. Growth 27 (1974) 118.
9. R. People and J. C. Bean: Appl. Phys. Lett. 47 (1985) 322.
10. Y. Nanishi, Y. Saito and T. Yamaguchi: Jpn. J. Appl. Phys. 42 (2003) 2549.
11. T. Takeuchi, S. Sota, M. Katsuragawa, M. Komori, H. Takeuchi, H. Amano and I. Akasaki: Jpn. J. Appl. Phys. 36 (1997) L382.
12. I. Mahboob, T. D. Veal and C. F. McConville: Phys. Rev. Lett. 92 (2004) 036804.
13. J. Wu, W. Walukiewicz, S. X. Li, R. Armitage, J. C. Ho, E. R. Weber, E. E. Haller, H. Lu, W. J. Schaff, A. Barcz and R. Jakiela: Appl. Phys. Lett. 84 (2004) 2805.