Reactive growth of NiO ultrathin films on Pd(1 0 0): A multitechnique approach

Journal of Electron Spectroscopy and Related Phenomena

Volumn 144-147, Issue , 2005, Pages 465-469

  Agnoli, S ^a   Orzali, T ^a   Sambi, M ^a   Granozzi, G ^a   Schoiswohl, J ^b   Surnev, S ^b   Netzer, F P ^b  

^a UNIVERSITY OF PADOVA   (Italy)

^b UNIVERSITY OF GRAZ   (Austria)

Author keywords

Epitaxy; Nickel oxide; Palladium; Ultrathin films

Indexed keywords

EPITAXIAL GROWTH; LOW ENERGY ELECTRON DIFFRACTION; MONOLAYERS; PALLADIUM; SCANNING; SCANNING TUNNELING MICROSCOPY; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

IN-PLANE COMPRESSIVE STRAIN; LATTICE MISMATCH; NICKEL OXIDE; X-RAY PHOTOELECTRON DIFFRACTION (XPD);

NICKEL COMPOUNDS;

EID: 17444412712     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2005.01.194     Document Type: Conference Paper

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