Accurate measurement of EUV multilayer period thicknesses by in situ automatic ellipsometry

Journal of Electron Spectroscopy and Related Phenomena

Volumn 144-147, Issue , 2005, Pages 1083-1085

  Tsuru, T ^a   Tsutou, T ^a   Hatano, T ^a   Yamamoto, M ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Ellipsometry; EUV multilayer; Layer by layer analysis; Rate monitoring

Indexed keywords

CURRENT DENSITY; ELLIPSOMETRY; FARADAY EFFECT; ION BEAMS; LITHOGRAPHY; MOLYBDENUM; SILICON; X RAY DIFFRACTION ANALYSIS;

EXTREME ULTRAVIOLET (EUV) MULTILAYER; IN SITU AUTOMATIC ELLIPSOMETRY; LAYER-BY-LAYER ANALYSIS; RATE MONITORING;

MULTILAYERS;

EID: 17444398221     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2005.01.087     Document Type: Conference Paper

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