Characterization of a highly photorefractive RF-sputtered SiO 2-GeO2 waveguide

Optics Express

Volumn 13, Issue 5, 2005, Pages 1696-1701

  Sebastian, S ^a   Conti, G Nunzi ^a   Pelli, S ^a   Righini, G C ^a   Chiasera, A ^b   Ferrari, M ^b   Tosello, C ^c  

^a IFAC CNR   (Italy)

^b IFN CNR   (Italy)

^c UNIVERSITY OF TRENTO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; GERMANIUM COMPOUNDS; IRRADIATION; KRYPTON; MAGNETRON SPUTTERING; PHOTOREFRACTIVE MATERIALS; REFRACTIVE INDEX;

DEPOSITION PROCESS; PHOTOINDUCED PHASE GRATING; PLANAR WAVEGUIDES; RADIO-FREQUENCY-MAGNETRON SPUTTERING (RFMS);

SILICA;

EID: 17444394902     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OPEX.13.001696     Document Type: Article

References (19)

1. V. Mizrahi, P. J. Lemaire, T. Erdogan, W. A. Reed, D. J. Di Giovanni, R. M. Atkins, "Ultraviolet laser fabrication of ultrastrong optical fiber gratings and of germania-doped channel waveguides," Appl. Phys. Lett. 63, 1727-1729 (1993).
2. M. Svalgaard, C.V. Poulsen, A. Bjarklev, O. Poulsen, "Direct UV writing of buried single mode channel waveguides in Ge-doped silica films," Electron. Lett. 30, 1401-1403 (1994).
3. G. D. Emmerson, S. P. Watts, C. B. E. Gawith, V. Albanis, M. Ibsen, R.B. Williams, P.G.R. Smith, "Fabrication of directly UV-written channel waveguides with simultaneously defined integral Bragg gratings," Electron. Lett. 38, 1531-1532 (2002).
4. H. Nishiyama, I. Miyamoto, S. Matsumoto, M. Saito, K. Kintaka, J. Nishii, "Direct laser writing of thermally stabilized channel waveguides with Bragg gratings," Opt. Express 12, 4589-4595 (2004). http://www. opticsexpress.org/abstract.cfm?URI=OPEX-12-19-4589
5. 2 glasses by excimer-laser irradiation," Opt. Lett 21, 1369-1362 (1996).
6. 2 glass thin films," Opt. Lett. 24, 1352-1354 (1999).
7. 2 films for ultraviolet laser writing of channel waveguides and Bragg gratings with Cr-loaded waveguide structure," Appl. Opt. 42, 4594-4598 (2003).
8. A. Chiasera, M. Montagna, C. Tosello, S. Pelli, G.C. Righini, M. Ferrari, L. Zampedri, A. Monteil, P. Lazzeri, "Enhanced spectroscopic properties at 1.5 μm in Er/Yb activated silica-titania planar waveguides fabricated by rf-sputtering," Opt. Mat. 25, 117-122 (2004).
9. 2 thin films glass films," Appl. Phys. Lett 64, 282-284 (1994).
10. J. Nishii, N. Kitamura, H. Yamanaka, H. Hosono, H. Kawazoe, "Ultraviolet-radiation-induced chemical reactions through one- and two-photon absorption processes in GeO2-SiO2 glasses," Opt. Lett. 20, 1184 (1995).
11. 2 glasses," Jpn. J. Appl. Phys. 35 (2B), Part2, 234-236 (1996).
12. 2 glasses," Phys. Rev. B 46, 11445-11450 (1992).
13. B. L. Zhang, K. Raghavachari, "Photoabsorption and photoluminescence of divalent defects in silicate and germanosilicate glasses: First-principles calculations," Phys. Rev. B 55, R15993-R15996 (1997).
14. 2," Phys. Rev. B 56, 7304-7312 (1997).
15. T. Uchino, M. Takahashi, K. Ichii, T. Yoko, "Microscopic model of photoinduced and pressure-induced UV spectral changes in germanosilicate glass," Phys. Rev. B 65, 172202-1 (2002).
16. P. Cordier, S. Dupont, M. Douay, G. Martinelli, P. Bernage, P. Niay, J. F.Bayon, L. Dong, "Evidence by transmission electron microscopy of densification associated to Bragg grating photoimprinting in germanosilicate optical fibers," Appl. Phys. Lett. 70, 1204-1206 (1997).
17. N. F. Borrelli, D. C. Allan, R. A. Modavis, "Direct measurement of 248- and 193-nm excimer-induced densification in silica-germania waveguide blanks," JOSA B 16, 1672-1679 (1999).
18. M. Born, E. Wolf, "The mean polarizability: the Lorentz-Lorenz formula," in Principles of Optics, (Pergamon Press, Oxford, 1980), pp. 87.
19. K.O. Hill, B. Malo, F. Bilodeau, D.C. Johnson, J. Albert, "Bragg gratings fabricated in monomode photosensitive optical fiber by exposure through a phase mask", Appl. Phys. Lett. 62, 1035-1037 (1993).