Ion-beam sputtering deposition of CsI thin films

Applied Physics A: Materials Science and Processing

Volumn 80, Issue 8, 2005, Pages 1789-1791

  Nitti, M A ^a   Valentini, A ^a   Senesi, G S ^b   Ventruti, G ^c   Nappi, E ^a   Casamassima, G ^a  

^a INFN SEZIONE DI BARI   (Italy)

^b Istituto di Metodologie Inorganiche e Plasmi   (Italy)

^c Dipartimento Geomineralogico   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; CESIUM COMPOUNDS; ION BEAMS; PHOTOEMISSION; QUANTUM EFFICIENCY; SPUTTERING; STOICHIOMETRY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CSI THIN FILMS; ION-BEAM SPUTTERING; PHOTO-EMISSIVE PROPERTIES; PHOTO-EMISSIVE SURFACES;

THIN FILMS;

EID: 17444388050     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-3097-9     Document Type: Article

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