Corrosion and oxidation behavior of ASiO4 (A=Ti, Zr and Hf) and silicon nitride with an HfSiO4 environmental barrier coating

Journal of Ceramic Processing Research

Volumn 6, Issue 1, 2005, Pages 81-84

  Ueno, Shunkichi ^a   Jayaseelan, D Doni ^a   Ohji, Tatsuki ^a   Lin, Hua Tay ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

HfSiO4; Oxidation; Silicon nitride; TiSiO4; Water vapor corrosion; ZrSiO4

Indexed keywords

HAFNIUM; SILICON NITRIDE; TITANIUM; ZIRCONIUM;

ARTICLE; CORROSION; DENSITY; ENVIRONMENTAL FACTOR; HIGH TEMPERATURE; LOW TEMPERATURE; MATERIAL COATING; OXIDATION; PURIFICATION; SURFACE PROPERTY;

EID: 17444385956     PISSN: 12299162     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)

1. S.M. Wiederhon, and M.K. Ferber, Current Opinion in Solid State and Materials Science 5 (2001) 311-316.
2. H.J. Choi, J.G. Lee, and Y.W. Kim, J. Mater. Sci. 32 (1997) 1937-1942.
3. E.J. Opila, J. Am. Ceram. Soc. 86 (2003) 1238-48.
4. D.S. Fox, E.J. Opila, Q.N. Nguyen, D.L. Humphrey, and S.M. Lewton, J. Am. Ceram. Soc. 86 (2003) 1256-61.
5. S. Ueno, N. Kondo, D.D. Jayaseelan, T. Ohji, and S. Kanzaki, ASME Paper 2003 GT2003-38878.
6. S. Ueno, D.D. Jayaseelan, and T. Ohji, J. Ceramic Processing Research in press.
7. S. Ueno, D.D. Jayaseelan, and T. Ohji, Int. J. Appl. Ceram. Technol. in press.
8. T. Fukudome, S. Tsuruzono, W. Karasawa, and Y. Ichikawa, ASME Paper 2002 GT2002-30627.