Fabrication and modeling of silicon-embedded high-Q inductors

Journal of Micromechanics and Microengineering

Volumn 15, Issue 4, 2005, Pages 849-854

  Pan, Tingrui ^a   Baldi, Antonio ^b   Davies Venn, Emile ^a   Drayton, Rhonda F ^a   Ziaie, Babak ^a  

^a University of Minnesota   (United States)

^b CSIC   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MECHANICAL POLISHING; CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; ELECTRIC INDUCTORS; FINITE ELEMENT METHOD; MAGNETOELECTRIC EFFECTS; MATHEMATICAL MODELS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; OPTIMIZATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

CIRCUIT MODEL; DESIGN PARAMETERS; PARASITIC CAPACITANCES; PROXIMITY EFFECTS;

SILICON;

EID: 17444361955     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/15/4/024     Document Type: Article

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