Photoproduct desorption dynamics in the UV ablation of model molecular solids. Ablation of chlorobenzene films at 248 nm

Applied Surface Science

Volumn 127-129, Issue , 1998, Pages 122-127

  Georgiou, Savas ^a   Koubenakis, Antonis ^a,b   Labrakis, John ^a   Lassithiotaki, Maria ^a,b  

^a INSTITUTE OF ELECTRONIC STRUCTURE AND LASER   (Greece)

^b UNIVERSITY OF CRETE   (Greece)

Author keywords

Chemical reactions; Chlorobenzene; Desorption dynamics; Photodissociation; Physical radiation effects; UV ablation; Van der Waals films

Indexed keywords

DESORPTION; DISSOCIATION; MASS SPECTROMETRY; REACTION KINETICS; THICK FILMS; ULTRAVIOLET RADIATION;

CHLOROBENZENE FILMS; PHOTOPRODUCT DESORPTION DYNAMICS; VAN DER WAALS FILMS;

LASER ABLATION;

EID: 17344381766     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)00621-1     Document Type: Article

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