Modification of electronical and optical properties in SiO2 films by electron beam irradiation

Solid State Phenomena

Volumn 63-64, Issue , 1998, Pages 333-340

  Fitting, H J ^a   Von Czarnowski, A ^a   Trukhin, A N ^a,b   Goldberg, M ^a,b   Barfels, T ^a,b  

^a UNIVERSITY OF ROSTOCK   (Germany)

^b UNIVERSITY OF LATVIA   (Latvia)

Author keywords

Charge injection; Dose Behaviour; IB Mode Softening; Irradiation Defects; Luminescence Centers; Silica; Thermal Annealing

Indexed keywords

AMORPHOUS FILMS; CATHODOLUMINESCENCE; ELECTRON BEAMS; ELECTRON EMISSION; ELECTRONIC PROPERTIES; RADIATION EFFECTS; VOLTAGE MEASUREMENT;

FULL WIDTH AT HALF MAXIMUM (FWHM);

SILICA;

EID: 17344372973     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Article

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