The depth distribution of organic additives in mortar measured with plasma-based Secondary Neutral Mass Spectrometry

Fresenius' Journal of Analytical Chemistry

Volumn 361, Issue 6-7, 1998, Pages 707-709

  Goschnick, J ^a   Mader U ^b   Sommer, M ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b SIKA TECHNOLOGY AG   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 17344362365     PISSN: 09370633     EISSN: None     Source Type: Journal    
DOI: 10.1007/s002160051000     Document Type: Article

References (4)

1. Mäder U (1996) Proceedings of the Third CANMET/ACI International Conference; St. Andrews by-the-Sea, Canada, p 215
2. Brundle CR, Grunze M, Mäder U, Blank N (1996) Surface Interface Analysis 24:549
3. Oechsner H (1984) In: Oechsner H (ed) Thin Film and Depth Profile Analysis, chap. 4; Top Curr Phys 34. Springer Verlag, Berlin Heidelberg New York, p 63-85
4. Fichtner M, Goschnick J, Schmidt UC, Schweiker A, Ache HJ (1992) J Vac Sci Technol A 10: 362