Application of in-situ ellipsometry to the fabrication of multi-layer optical coatings with sub-nanometre accuracy

Thin Solid Films

Volumn 455-456, Issue , 2004, Pages 376-379

  Dligatch, Svetlana ^a   Netterfield, Roger P ^a   Martin, Barry ^a  

^a CSIRO   (Australia)

Author keywords

In situ ellipsometry; Optical coatings

Indexed keywords

COLOR; ELLIPSOMETRY; INFRARED RADIATION; ION BEAM ASSISTED DEPOSITION; MULTILAYERS; REAL TIME SYSTEMS; REFRACTIVE INDEX; THIN FILMS;

FILM PARAMETERS; IN SITU ELLIPSOMETRY; LASER PROTECTION APPLICATION; NEAR INFRARED BLOCKING FILTERS;

OPTICAL COATINGS;

EID: 17144475007     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.02.020     Document Type: Conference Paper

References (7)

1. Dobrowolski A. 2nd ed Handbook of Optics. 1:1995;McGraw-Hill. Chapter 42.
2. Thelen A. Design of Optical Interference Coatings. 1989;McGraw-Hill.
3. H.A. Macleod, The Essential Macleod, Thin Film Center Inc.
4. TFCalc by Software Spectra, Inc., 14025 N.W. Harvest Lane, Portland, OR 97229 USA.
5. Azzam R.M.A., Bashara N.M. Ellipsometry and Polarised Light. 1977;North Holland, Amsterdam.
6. Martin P.J., Macleod H.A., Netterfield R.P., Pacey C.G., Sainty E.G. Ion-beam-assisted deposition of thin films. Appl. Opt. 22:1983;178-184.
7. Johs B., Herzinger C., Dinan J.H., Cornfeld A., Benson J.D., Doctor D., Olson G., Ferguson I., , et al. Real-time monitoring and control of epitaxial semiconductor growth in a production environment by in situ spectroscopic ellipsometry. Thin Solid Films. 313-314:13 February1998;490-495.