Advanced Materials and Forms: Photosensitive Metathesis Polymers

ACS Symposium Series

Volumn 620, Issue , 1996, Pages 363-380

  Muhlebach A ^a   Schaedeli, U ^a  

^a CIBA GEIGY LTD   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 17144449222     PISSN: 00976156     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Article

References (19)

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