Spectroscopic ellipsometry analysis for investigation of the modification of thin film p-a-Si1-xCx:H after ultraviolet treatment in an Argon ambient

Thin Solid Films

Volumn 455-456, Issue , 2004, Pages 482-485

  Myong, Seung Yeop ^a   Kim, Sang Soo ^a   Lim, Koeng Su ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Hydrogen emission; Photo CVD; Spectroscopic ellipsometry; UTA

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; GAS EMISSIONS; HYDROGENATION; PERMITTIVITY; SILICON ALLOYS; SOLAR CELLS; SPECTROSCOPIC ANALYSIS; SURFACE TREATMENT;

HYDROGEN EMISSIONS; PHOTOCHEMICAL VAPOR DEPOSITION; SPECTROSCOPIC ELLIPSOMETRY; ULTRAVIOLET TREATMENT IN AR AMBIENT (UTV);

THIN FILMS;

EID: 17144443018     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.01.018     Document Type: Conference Paper

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