GaAs oxide desorption under extreme ultraviolet photon flux

Advanced Functional Materials

Volumn 15, Issue 4, 2005, Pages 587-592

  Ercolani, Daniele ^a,b   Lazzarino, Marco ^a   Mori, Giorgio ^a,c   Ressel, Barbara ^a   Sorba, Lucia ^b   Locatelli, Andrea ^a,d   Cherifi, Salia ^d   Ballestrazzi, Antonio ^b   Heun, Stefan ^d  

^a LABORATORIO TASC   (Italy)

^b UNIVERSITY OF MODENA AND REGGIO EMILIA   (Italy)

^c UNIVERSITY OF TRIESTE   (Italy)

^d SINCROTRONE TRIESTE   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ANODIC OXIDATION; ATOMIC FORCE MICROSCOPY; OPTOELECTRONIC DEVICES; PHOTOEMISSION; PHOTOIONIZATION; PHOTONS; STOICHIOMETRY; SYNCHROTRONS;

COVALENT BONDS; MICROSCOPIC ANALYSIS; OXIDE STRUCTURES; PHOTON FLUXES;

GALLIUM COMPOUNDS;

EID: 17144425308     PISSN: 1616301X     EISSN: None     Source Type: Journal    
DOI: 10.1002/adfm.200400033     Document Type: Article

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