Diffusion of nickel and zinc in germanium

Defect and Diffusion Forum

Volumn 143-147, Issue , 1997, Pages 1059-1066

  Giese, A ^a   Bracht, H ^a   Stolwijk, N A ^a   Mehrer, H ^a  

^a UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

Diffusion; Dissociative mechanism; Germanium; Nickel; RTA; Spreading resistance; Vacancy mechanism; Zinc

Indexed keywords

DISSOCIATION; GERMANIUM; NICKEL; RAPID THERMAL ANNEALING; ZINC;

COMPLEMENTARY ERROR FUNCTIONS; CONCENTRATION-DEPTH PROFILE; DIFFUSION EXPERIMENTS; DISSOCIATIVE MECHANISMS; RAPID THERMAL ANNEALING (RTA); SPREADING RESISTANCE; TEMPERATURE RANGE; VACANCY MECHANISMS;

DIFFUSION;

EID: 17144409924     PISSN: 10120386     EISSN: 16629507     Source Type: Journal    
DOI: 10.4028/www.scientific.net/DDF.143-147.1059     Document Type: Article

References (12)

1. N.A. Stolwijk, W. Frank, J. Hölzl, S.J. Pearton, E.E. Haller, Appl. Phys. 57, 5211 (1985)
2. H. Bracht, N.A. Stolwijk, H. Mehrer, Phys. Rev. B 43, 14465 (1991)
3. Y. Kamiura, F. Hashimoto, Jap. J. Appl. Phys. 28, 763 (1989)
4. F. van der Maesen, J.A. Brenkman, J. Electrochem. Soc. 102, 229 (1955)
5. W.C. Dunlap, jr., Phys. Rev. 94, 1531 (1954)
6. V.E. Kosenko, Proc. Acad. Sci. USSR, Phys. Ser. (English Transi.) 20, 1399 (1956)
7. F.C. Frank, D. Turnbull, Phys. Rev. 104, 617 (1956)
8. W. Jüngling, P. Pichler, S. Selberherr, E. Guerrero, H. Pötzl, IEEE Trans. on Electron. Devices 32, 156 (1985)
9. U. Södervall, H. Odelius, A. Lodding, U. Roll, B. Predel, W. Gust, P. Dorner, Philos. Mag. A 54, 539 (1986)
10. N.A. Stolwijk, F. Wenwer, H. Bracht, H. Mehrer, Diffusion in Materials, ed. by A. Laskar et. al., NATO ASI Series E 179, 297 (1990)
11. M. Werner, H. Mehrer, H.D. Hochheimer, Phys. Rev. B 32, 3930 (1985)
12. N.A. Stolwijk, Defect and Diffusion Forum 95-98, 895 (1993)