Study on the over-top coating suppressing surface insoluble layer generation for chemical amplification resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 1925, Issue , 1993, Pages 31-42

  Kumada, Teruhiko ^a   Tanaka, Youko ^a   Ueyama, Akemi ^a   Kubota, Shigeru ^a   Koezuka, Hiroshi ^a   Hanawa, Tetsuro ^a   Morimoto, Hiroaki ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; ORGANIC POLYMERS; X RAY PHOTOELECTRON SPECTROSCOPY;

AIRBORNE CONTAMINANTS; CHEMICAL AMPLIFICATION; LAYER GENERATION; PATTERN SIZE; PHOTOACID GENERATORS; PROCESS DELAY; RESIST FILMS; WATERSOLUBLE POLYMERS;

CHEMICAL STABILITY;

EID: 17144366407     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.154764     Document Type: Conference Paper

References (5)

1. H. Ito and C. G. Willson, "Application of Photoinitiators to the design of resists for semiconductor manufacturing", ACS Symp. Ser., 242, 11(1984).
2. S. A. MacDonald, N. J. Clecak, H. R. Wendt, C. G. Willson, C. D. Snyder, C. J. Knors, N. B. Deyoe, J. G. Maltabes, J. R. Morrow, A. E. McGuire and S. J. Hohes, "Airborne chemical contamination of a chemically amplified resist", Proc. SPIE, 1466, 2(1991).
3. W. D. Hinsberg, S. A. MacDonald, N. J. Clecak and C. D. Snyder, "Quantitation of airborne chemical contamination of chemically amplified resists using radiochemical analysis", Proc. SPIE, 1672, 24(1992).
4. T. Kumada, S. Kubota, H. Koezuka, T. Hanawa, S. Kishimura and H. Nagata, "Relationship between' pattering and dissolution characteristics of chemical amplification resists using partly protected poly(p-vinylphenol)", J. Photopolym. Sci. Techol., 4, 469(1991).
5. C. D. Wager, W. M. Riggs, L. E. Davis, J. F. Moulder and G. E. Muilenberg, Handbook of X-ray photoelectron spectroscopy, Parkin-Elmer Corporation, (1979).