In-situ GIXRD characterization of the crystallization of Ni-Ti sputtered thin films

Materials Science Forum

Volumn 455-456, Issue , 2004, Pages 342-345

  Martins, Rui M S ^a   Silva, Rui J C ^a   Fernandas, Francisco M Braz ^a   Pereira, Luis ^a   Gordo, Paulo R ^b   Maneira, Manuel J P ^b   Schell, Norbert ^c,d  

^a DEPARTAMENTO DE CIÊNCIA DOS MATERIAIS   (Portugal)

^b UNIVERSIDADE NOVA DE LISBOA   (Portugal)

^c EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^d INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

Metal characterization; Nitinol; Shape memory alloy; Thin films; X ray diffraction

Indexed keywords

CRYSTALLIZATION; DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; EVAPORATION; HEAT LOSSES; OXIDATION RESISTANCE; SCANNING ELECTRON MICROSCOPY; SHAPE MEMORY EFFECT; SPUTTERING; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

METAL CHARACTERIZATION; NITINOL; SHAPE MEMORY ALLOYS (SMA); TRANSFORMATION TEMPERATURES;

NICKEL ALLOYS;

EID: 17044458405     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.455-456.342     Document Type: Conference Paper

References (6)

1. Committee on Advanced Materials and Fabrication Methods for Microelectromechanical Systems: Microelectromechanical systems, advanced materials and fabrication methods (National Materials Advisory Board, National Academy Press, Washington, D.C. 1997).
2. a T. Nogueira, R.J.C. Silva, P. Nunes, D. Costa, I. Ferreira, R. Martins: Sensors and Actuators Vol. 99/1-2 (2002), p. 53.
3. L. Pereira, H. Águas, R. Miguel Martins, F. Braz Fernandes, E. Fortunate, R. Martins: Physics and Application of Disordered Materials, edited by Popescu Mihai (2002), p. 373.
4. P.M. Braz Fernandes, R.M.S. Martins, R.J.C. Silva, A. Marques, R. Martins: Project-Group ESRF-Beamline (ROBL-CRG), Bi-Annual Activity Report, 2001/2002, FZR-364 (2003), Rossendorf, p. 11.
5. W. Matz, N. Schell, G. Bernhard, F. Prokert, T. Reich, J. Claußner, et al: Journal of Synchrotron Radiation Vol. 6 (1999), p. 1076.
6. Y.Q. Yang, H.S. Jia, Z.F. Zhang, H.M. Shen, A. Hu, Y.N. Wang: Materials Letters Vol. 22 (1995), p. 137.