Implementing real-time endpoint control in CMP

Semiconductor International

Volumn 19, Issue 8, 1996, Pages

  Litvak, Herbert E ^a   Tzeng, Huey Ming ^a  

^a Luxtron Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROL; DIGITAL FILTERS; INSPECTION; INTERFACES (MATERIALS); INTERFEROMETRY; METALLIC FILMS; MONITORING; REAL TIME SYSTEMS; SPURIOUS SIGNAL NOISE;

CHEMICAL MECHANICAL POLISHING; ENDPOINT DETECTION; MOTOR CURRENT MONITORING; OFF LINE WAFER INSPECTIONS; OPTICAL INTERFEROMETRY; WAFER;

POLISHING;

EID: 17044445615     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)