Influence of ultrsonification in CdS thin film deposition in PCD technique

Materials Letters

Volumn 59, Issue 14-15, 2005, Pages 1795-1800

  Soundeswaran, S ^a   Kumar, O Senthil ^a   Babu, S Moorthy ^a   Ramasamy, P ^a   Dhanasekaran, R ^a  

^a ANNA UNIVERSITY   (India)

Author keywords

CdS; Photochemical deposition; Raman spectra; Surface morphology; X ray diffraction

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CADMIUM SULFIDE; DEPOSITION; HALL EFFECT; MORPHOLOGY; NUCLEATION; PHOTOCHEMICAL REACTIONS; RAMAN SPECTROSCOPY; SOLUTIONS; SURFACES; ULTRASONIC WAVES; X RAY DIFFRACTION ANALYSIS;

BAND GAP; CDS; NONAQUEOUS SOLUTIONS; PHOTOCHEMICAL DEPOSITION;

THIN FILMS;

EID: 17044404285     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2005.01.069     Document Type: Article

References (21)

1. J.M. Dona, and J. Herrero J. Electrochem. Soc. 144 1997 81
2. J.M. Dona, and J. Herrero J. Electrochem. Soc. 144 1997 4091
3. S. Soundeswaran, O. Senthil Kumar, R. Dhanasekaran, P. Ramasamy, R. Kumaresan, and M. Ichimura Mater. Chem. Phys. 82 2003 253
4. Joel Pantoja Enriquez, and Xavier Mathew Sol. Energy Mater. Sol. Cells 76 2003 313
5. H. El Maliki, J.C. Bernede, S. Marsillac, J. Pinel, X. Castel, and J. Pouzet Appl. Surf. Sci. 205 2003 65
6. S. Soundeswaran, O. Senthil Kumar, and R. Dhanasekaran Mater. Lett. 58 2004 2381
7. F. Goto, M. Ichimura, and E. Arai Jpn. J. Appl. Phys. 36 1997 L1146
8. K. Shirai, F. Goto, and M. Ichimura Jpn. J. Appl. Phys. 35 1995 L1483
9. M. Ichimura, F. Goto, Y. Ono, and E. Arai J. Cryst. Growth 198/199 1999 308
10. K.S. Suslick, S.B. Choe, A.A. Cichowlas, and M.W. Grinstaff Nature 353 1991 414
11. Jun Young Choi, Kang-Jin Kim, Ji-Beom Yoo, and Donghwan Kim Sol. Energy 64 1998 41
12. Millan M. Mdleleni, Taeghwan Hyeon, and Kenneth S. Suslick J. Am. Chem. Soc. 120 1998 6189
13. G.S. Wu, X.Y. Yuan, T. Xie, G.C. Xu, L.D. Zhang, and Y.L. Zhuang Mater. Lett. 58 2004 794
14. G.Z. Wang, W. Chen, C.H. Liang, Y.W. Wang, G.W. Meng, and L.D. Zhang Inorg. Chem. Commun. 4 2001 208
15. M. Nago, and S. Watanabe Jpn. J. Appl. Phys. 7 1968 684
16. I. Kaur, D.K. Pandya, and K.L. Chopra J. Electrochem. Soc. 127 1980 943
17. R.L. Call, N.K. Jaber, K. Seshan, and J.R. White Jr. Sol. Energy Mater. 2 1980 27
18. A. Mondal, T.K. Chaudhuri, and P. Pramanik Sol. Energy Mater. 7 1983 431
19. S.A. Toms, O. Vigil, J.J. Alvarado-Gil, R. Lozada-Morales, O. Zelaya-Angel, H. Vargas, and A. Ferreira da Silva J. Appl. Phys. 78 1995 2204
20. F. Atay, V. Bilgin, I. Akyuz, and S. Kose Mater. Sci. Semicond. Process. 6 2003 197
21. M. Ichimura, A. Usami, T. Wada, M. Funato, K. Ichino, Sz. Fujita, and Sg. Fujita Phys. Rev. 46 1992 4273