Photoinduced resistivity changes in Bi0.4 Ca0.6 Mn O3 thin films

Applied Physics Letters

Volumn 86, Issue 7, 2005, Pages 1-3

  Smolyaninova, V N ^a   Rajeswari, M ^a   Kennedy, R ^a   Overby, M ^a   Lofland, S E ^b   Chen, L Z ^c   Greene, R L ^c  

^a TOWSON UNIVERSITY   (United States)

^b ROWAN UNIVERSITY   (United States)

^c UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE-ORDERING TEMPERATURE; COMPRESSIVE STRAIN; PHOTOINDUCED RESISTIVITY; TEMPERATURE DEPENDENCE;

BISMUTH COMPOUNDS; CRYSTAL STRUCTURE; CRYSTALLOGRAPHY; FILM GROWTH; LASER BEAMS; LATTICE CONSTANTS; STRAIN; X RAY SCATTERING;

THIN FILMS;

EID: 17044373233     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1868869     Document Type: Article

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