Deposition of plasma-polymerized hydroxyethyl methacrylate (HEMA) on silicon in presence of argon plasma

Applied Surface Science

Volumn 245, Issue 1-4, 2005, Pages 186-190

  Bodas, Dhananjay S ^a   Desai, Shrojal M ^b   Gangal, S A ^a  

^a UNIVERSITY OF PUNE   (India)

^b Michigan State University   (United States)

Author keywords

HEMA; Plasma polymerization; SEM; Silicon; XPS

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; DEPOSITION; PLASMA POLYMERIZATION; PLASMAS; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES;

2-HYDROXYETHYL METHACRYLATE (HEMA); FUNCTIONAL GROUPS; INDUCTIVELY COUPLED PLASMA POLYMERIZATION; SILICON SUBSTRATE;

ORGANIC COMPOUNDS;

EID: 17044372828     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.10.010     Document Type: Article

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