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Volumn 57-58, Issue , 1997, Pages 287-292
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Modification of the recombination activity of dislocations in silicon by hydrogenation, phosphorous diffusion and heat treatments
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Author keywords
[No Author keywords available]
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Indexed keywords
COOLING;
DEFECTS;
DIFFUSION;
HYDROGENATION;
SEMICONDUCTOR DEVICE MANUFACTURE;
SILICON;
ANNEALING;
CRYSTAL IMPURITIES;
DIFFUSION IN SOLIDS;
DISLOCATIONS (CRYSTALS);
ELECTRON BEAMS;
LOW TEMPERATURE EFFECTS;
PHOSPHORUS;
QUENCHING;
DISLOCATION ACTIVITY;
ELECTRON-BEAM-INDUCED CURRENT;
MULTICRYSTALLINE SI;
PHOSPHOROUS DIFFUSION;
PHOSPHORUS DIFFUSION;
RECOMBINATION ACTIVITY;
SHALLOW STATE;
TEMPERATURE DEPENDENCIES;
PHOSPHORUS;
SEMICONDUCTING SILICON;
ELECTRON BEAM INDUCED CURRENT (EBIC) MEASUREMENTS;
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EID: 16944363082
PISSN: 10120394
EISSN: None
Source Type: Book Series
DOI: 10.4028/www.scientific.net/ssp.57-58.287 Document Type: Article |
Times cited : (4)
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References (12)
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