Thermal and chemical stability of reflowed-photoresist microlenses

Journal of Micromechanics and Microengineering

Volumn 14, Issue 3, 2004, Pages 398-402

  Han, Myung Geun ^a   Park, Yoon Jung ^b   Kim, Seoung Hoe ^a   Yoo, Byueng Su ^b   Park, Hyo Hoon ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL STABILITY; THERMAL REFLOW;

ACETONE; CAMERAS; CHARGE COUPLED DEVICES; COST EFFECTIVENESS; HEAT TREATMENT; HIGH TEMPERATURE EFFECTS; METHANOL; OPTICAL COMMUNICATION; PHOTORESISTS; REFRACTIVE INDEX; SHRINKAGE; THERMODYNAMIC STABILITY; THERMOPLASTICS;

MICROLENSES;

EID: 1642619076     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/14/3/012     Document Type: Article

References (10)

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