Preparation of a thin film of Al/Al2O3 using a single source precursor

Journal of Metastable and Nanocrystalline Materials

Volumn 15-16, Issue , 2003, Pages 279-282

  Veith, M ^a   Andres, K ^a  

^a SAARLAND UNIVERSITY   (Germany)

Author keywords

Chemical vapor deposition cvd; Hydrido aluminium oxide; Metal metal oxide composites; Single source precursor

Indexed keywords

ALUMINA; ALUMINUM; AMORPHOUS MATERIALS; CHEMICAL VAPOR DEPOSITION; COMPOSITE MATERIALS; DECOMPOSITION; ELECTRON MICROSCOPY; HIGH TEMPERATURE EFFECTS; HYDROGEN BONDS; SURFACE STRUCTURE; X RAY DIFFRACTION ANALYSIS;

HYDRIDO-ALUMINIUM-OXIDE; METAL/METAL OXIDE COMPOSITES; SINGLE SOURCE PRECURSORS;

THIN FILMS;

EID: 1642560375     PISSN: 14226375     EISSN: None     Source Type: Journal    
DOI: 10.4028/www.scientific.net/JMNM.15-16.279     Document Type: Conference Paper

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