Novel manufacturing process of waveguide using selective photobleaching of polysilane films by UV light irradiation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5246, Issue , 2003, Pages 119-130

  Tsushima, Hiroshi ^a   Watanabe, Emi ^a   Yoshimatsu, Saori ^a   Okamoto, Satoshi ^a   Oka, Takeshi ^a   Imoto, Katsuyuki ^b  

^a Nippon Paint Co Ltd ^*  (Japan)

^b HITACHI CABLE LTD   (Japan)

Author keywords

Low loss film; Optical interconnects; Passive optical device; Photobleaching type waveguide; Polysilane; Thermal stability

Indexed keywords

BLEACHING; COSTS; ELECTRONIC EQUIPMENT MANUFACTURE; HEAT TREATMENT; IRRADIATION; OPTICAL INTERCONNECTS; PHOTOCONDUCTING MATERIALS; POLYSILANES; REACTIVE ION ETCHING; THERMODYNAMIC STABILITY; THIN FILMS; ULTRAVIOLET RADIATION;

LOW LOSS FILMS; PASSIVE OPTICAL DEVICES; PASSIVE OPTICAL NETWORKS (PON); PHOTOBLEACHING TYPE WAVEGUIDES;

OPTICAL WAVEGUIDES;

EID: 1642513800     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.510965     Document Type: Conference Paper

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